Several months ago the Wall Street Journal had an article on a new fabrication process that would drastically increase the number of transistors that could be crammed onto a chip. It may have been Intel doing the research which involves using microscopic silicon strands that are cross connected.
I have searched for this article on the WSJ web page, but cannot find it. It may already be in the archives. If any one remembers this article or could post it here it would be appreciated.
Joel