Why MOS referred to Metal-Oxide Semiconductor when there is typically no Metal-Oxide present ? Should it be Metal-Oxide-Semiconductor representing the three layers of the device?
- posted
17 years ago
-- Bye. Jasen
MOS
Loading thread data ...
- Vote on answer
- posted
17 years ago
"jasen"
formatting link
..... Phil
- Vote on answer
- posted
17 years ago
"A metal-oxide-semiconductor (MOS) structure is obtained by depositing a layer of silicon dioxide (SiO2) and a layer of metal (polycrystalline silicon is actually used instead of metal) on top of a semiconductor die. As the silicon dioxide is a dielectric material its structure is equivalent to a plane capacitor, with one of the electrodes replaced by a semiconductor."
Read more here:
formatting link